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학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
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연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 발행연도
- 2016.4
- 수록면
- 251 - 256 (6page)
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초록· 키워드
오류제보하기
The prediction of thermal effects in lithography projection objective plays a significant role in thereal-time dynamic compensation of thermal aberrations. For the illuminated lithography projection objective,this paper applies finite element analysis to get the temperature distribution, surface deformation and stressdata. To improve the efficiency, a temperature distribution function model is proposed to use for thesimulation of thermal aberrations with the help of optical analysis software CODE V. SigFit is approvedintegrated optomechanical analysis software with the feature of calculating OPD effects due to temperaturechange, and it is utilized to prove the validation of the temperature distribution function. Results showthat the impact of surface deformation and stress is negligible compared with the refractive index change;astigmatisms and 4-foil aberrations dominate in the thermal aberration, about 1.7 λ and 0.45 λ. The systemtakes about one hour to reach thermal equilibrium and the contrast of the imaging of dense lines get worseas time goes on.
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등록된 정보가 없습니다.
참고문헌 (14)
참고문헌 신청
C. Liu / 2013 / Wavefront aberration compensation of projection lens using clocking lens elements / Appl. Opt 52:5398~5401
M. Y. Ni / 2012 / Design and analysis of kinematic lens positioning structure in lithographic projection objective / Chinese Optics 5:476~484
L. Zhao / 2012 / Design and analysis for high-precision lens support structure of objective lens for lithography / Acta Optica Sinica 9:217~222
T. Nakashima / 2008 / Thermal aberration control in projection lens / Proc. SPIE 6924:69241V-1~69241V-9
X. F. Yu / 2014 / Analysis and experiments of the thermal-optical performance for a kinematically mounted lens element / Appl. Opt 53:4079~4084
M. Y. Ni / 2012 / Design and analysis of kinematic lens positioning structure in lithographic projection objective / Chinese Optics 5:476~484
L. Zhao / 2012 / Design and analysis for high-precision lens support structure of objective lens for lithography / Acta Optica Sinica 9:217~222
T. Nakashima / 2008 / Thermal aberration control in projection lens / Proc. SPIE 6924:69241V-1~69241V-9
X. F. Yu / 2014 / Analysis and experiments of the thermal-optical performance for a kinematically mounted lens element / Appl. Opt 53:4079~4084
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