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논문 기본 정보

자료유형
학술저널
저자정보
Yoon-Gu Lee (Seoul National University) Michael McInerney (Rose-Hulman Institute of Technology) Young-Chang Joo (Seoul National University) In-Suk Choi (Seoul National University) Sarah Eunkyung Kim (Seoul National University of Science and Technology)
저널정보
대한금속·재료학회 Electronic Materials Letters Electronic Materials Letters Vol.20 No.1
발행연도
2024.1
수록면
1 - 25 (25page)
DOI
https://doi.org/10.1007/s13391-023-00433-4

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As semiconductor device scaling faces a severe technical bottleneck, vertical die stacking technologies have been developedto obtain high performance, high density, low latency, cost eff ectiveness and a small form factor. This stacking technologyis receiving great attention from industry as a core technology from the point of view of recent heterogeneous integrationtechnology. Most importantly, bonding using copper is aggressively studied to stack various wafers or dies and realizegenuine three-dimensional packaging. Copper is emerging as the most attractive bonding material due to its fi ne-pitch patternabilityand high electrical performance with a CMOS-friendly process. Unfortunately, copper is quickly oxidized, and ahigh bonding temperature is required for complete Cu bonding, which greatly exceeds the thermal budget for the packagingprocess. Additionally, the size of Cu pads is decreasing to increase the density of interconnections. Therefore, various copperbonding methods have been studied to realize copper oxidation prevention, a low bonding temperature, and a fi ne-pitch Cupad structure with a high density. Furthermore, recently, hybrid bonding, which refers to the simultaneous bonding of copperpads and surrounding dielectrics, has been considered a possible solution for advanced bonding technology. This paperreviews recent studies on various copper bonding technologies, including Cu/oxide hybrid bonding.

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